ISO/TR 15969:2021

Surface chemical analysis — Depth profiling — Measurement of sputtered depth

Publication date: Mar 17, 2021

General information

Current stage: 60.60 Effective date: Mar 17, 2021

Originator: ISO

Owner: ISO/TC 201/SC 4

Type: Technical Report

ICS: 71.040.40

Languages: English

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Status: Published

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Scope

This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.

Life cycle

PREVIOUSLY

Revises
ISO/TR 15969:2001

NOW

PUBLISHED
ISO/TR 15969:2021
60.60 Standard published
Mar 17, 2021

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