ISO 14237:2010

Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials

Publication date: Jul 9, 2010

General information

Current stage: 90.60 Effective date: Jun 5, 2021

Originator: ISO

Owner: ISO/TC 201/SC 6

Type: International Standard

ICS: 71.040.40

Languages: English French

Buying

Status: Published

PDF - EC$373.24

Paper - EC$373.24

PDF and Paper - EC$746.48

Language

Language in which you want to receive the document.

Scope

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

Life cycle

PREVIOUSLY

Revises
ISO 14237:2000

NOW

PUBLISHED
ISO 14237:2010
90.60 Close of review
Jun 5, 2021

Preview

Only informative sections of projects are publicly available. To view the full content, you will need to members of the committee. If you are a member, please log in to your account by clicking on the "Log in" button.