Draft
This document defines the terms involved in atomic layer deposition technology and the corresponding applications. The basis of atomic layer deposition and the physical and chemical properties of thin films, as well as their detection methods are included. The terms in corresponding applications of thin films via atomic layer deposition are defined, such as microelectronics, photovoltaics, display, energy and catalysis.
IN_DEVELOPMENT
ISO/DIS 8181
40.20
DIS ballot initiated: 12 weeks
Dec 28, 2022
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